Intel receives first High-NA EUV chipmaking tool from ASML — Intel is the first pathfinder for revolutionary new lithography tech

On Friday, Intel announced that it had received the first major components of ASML's extreme ultraviolet (EUV) lithography tool. The two companies will begin assembling the machine shortly as Intel hopes to be the first company to use High-NA EUV equipment for mass production of chips in the coming years. The tool uses a 0.55 numerical aperture lens (High-NA), thus allowing chipmakers to print smaller features on processors than was previously possible. We previously covered ASML's announcement last month that it had begun shipping the tool to Intel.